IBM and Lam’s new partnership paves the way toward sub-1nm logic using High-NA EUV — Albany lab to pioneer dry resist process integration
The collaboration targets high-NA EUV dry resist process integration at IBM’s Albany research facility.

The collaboration targets high-NA EUV dry resist process integration at IBM’s Albany research facility.

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Five-year collaboration targets nanostack devices and backside power delivery at sub-1nm nodes.

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Aaron Klotz is a contributing writer for Tom\u2019s Hardware, covering news related to computer hardware such as CPUs, and graphics cards. “,”collapsible”:{“enabled”:true,”maxHeight”:250,”readMoreText”:”Read more”,”readL…

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