ASML looks to increase prices of its Low-NA EUV tools beyond existing productivity-based model — company wants to capture the value of all the advantages its to

ASML looks to increase prices of its Low-NA EUV tools beyond existing productivity-based model — company wants to capture the value of all the advantages its to

ASML will be unable to hike prices of Low-NA EUV systems for another couple of years. Since orders that are in ASML's backlog already carry a sales value, subject to inflation adjustments, prices for much of the 2027 and early 2028 output may already be contractually determined. Unless existing contracts can be renegotiated, higher pricing could therefore primarily apply to 2028 shipments and beyond, or for new orders that somehow get squeezed in in 2027. The NXE:4200G, due in 2029, should naturally lift average selling prices anyway as it gets major performance improvements.

For TSMC, however, the issue is strategic. The foundry's leading-edge roadmap through 2030 relies on extending Low-NA EUV with better masks, computational lithography, and multipatterning. Until then, TSMC's strategy has always been avoiding High-NA EUV until at least its 10A-class (1 nm-class) technology. If ASML hikes prices of its future Low-NA EUV lithography systems, it will likely affect all of TSMC's plans for the next several years.

TSMC already operates the world's largest Low-NA EUV fleet and needs many more scanners for fabs in Taiwan, the U.S., and Japan as it executes its global expansion strategy. Consequently, even modest increases beyond TSMC's projections could add billions to capital spending, reduce the economic advantage of postponing High-NA, and ultimately raise its manufacturing costs. Moreover, accepting higher prices now could establish the baseline for dozens or hundreds of future systems, which will allow ASML to capture a larger share of the economic value created by increasingly productive lithography equipment.

Can this force TSMC to transition to High-NA EUV tools earlier than planned? Moving to High-NA EUV requires not only €350-million-plus scanners but also new resists, masks, pellicles, metrology, design rules, and computational lithography flows, which are likely not ready at TSMC.

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Anton Shilov is a contributing writer at Tom\u2019s Hardware. Over the past couple of decades, he has covered everything from CPUs and GPUs to supercomputers and from modern process technologies and latest fab tools to high-tech industry trends. ","collapsible":{"enabled":true,"maxHeight":250,"readMoreText":"Read more","readLessText":"Read less"}}), "https://slice.vanilla.futurecdn.net/13-4-25/js/authorBio.js"); } else { console.error('%c FTE ','background: #9306F9; color: #ffffff','no lazy slice hydration function available'); } Anton Shilov Social Links Navigation Contributing Writer Anton Shilov is a contributing writer at Tom’s Hardware. Over the past couple of decades, he has covered everything from CPUs and GPUs to supercomputers and from modern process technologies and latest fab tools to high-tech industry trends.

thestryker Let me play the world's tiniest violin for TSMC since they're also the ones raising prices on established nodes because, checks notes , they can. This is what happens when there realistically isn't competition and the only reason I can think of ASML has stuck with proportional increases this long is their monopoly. Reply

vossile So where exactly is the source regarding TSMC's anger? I don't see anything in the text regarding anybody from TSMC talking out about ASML's pricing changes. Reply

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