euv

Samsung Foundry updates process roadmap to move 1.4nm node to 2029 — high-NA EUV will enable 1nm-class and smaller nodes in 2030 and beyond

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For chipmakers, the main challenge with ASML’s High-NA EUV tools are substantially higher costs compared to Low-NA EUV systems used today, which greatly increases costs of fabs and can affect costs of chips. Meanwhile, H…

ASML looks to increase prices of its Low-NA EUV tools beyond existing productivity-based model — company wants to capture the value of all the advantages its to

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ASML will be unable to hike prices of Low-NA EUV systems for another couple of years. Since orders that are in ASML’s backlog already carry a sales value, subject to inflation adjustments, prices for much of the 2027 and…

Intel becomes the first company to ship high-volume logic chips made with ASML’s High NA EUV — select Panther Lake layers on 18A are now dual-qualified for 0.55

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Intel and ASML have been working towards this milestone for several years. In 2024, Intel completed installation of one of the industry’s first commercial High NA EUV lithography systems , the TWINSCAN EXE:5000, at its H…

ASML looks to increase prices of its Low-NA EUV tools beyond existing productivity-based model — company wants to capture the value of all the advantages its to

by

ASML will be unable to hike prices of Low-NA EUV systems for another couple of years. Since orders that are in ASML’s backlog already carry a sales value, subject to inflation adjustments, prices for much of the 2027 and…

Intel becomes the first company to ship high-volume logic chips made with ASML’s High NA EUV — select Panther Lake layers on 18A are now dual-qualified for 0.55

by

Intel and ASML have been working towards this milestone for several years. In 2024, Intel completed installation of one of the industry’s first commercial High NA EUV lithography systems , the TWINSCAN EXE:5000, at its H…

Intel becomes the first company to ship high-volume logic chips made with ASML’s High NA EUV — select Panther Lake layers on 18A are now dual-qualified for 0.55

by

Intel and ASML have been working towards this milestone for several years. In 2024, Intel completed installation of one of the industry’s first commercial High NA EUV lithography systems , the TWINSCAN EXE:5000, at its H…

Intel becomes the first company to ship high-volume logic chips made with ASML’s High NA EUV — select Panther Lake layers on 18A are now dual-qualified for 0.55

by

Intel and ASML have been working towards this milestone for several years. In 2024, Intel completed installation of one of the industry’s first commercial High NA EUV lithography systems , the TWINSCAN EXE:5000, at its H…

Intel becomes the first company to ship high-volume logic chips made with ASML’s High NA EUV — select Panther Lake layers on 18A are now dual-qualified for 0.55

by

Intel and ASML have been working towards this milestone for several years. In 2024, Intel completed installation of one of the industry’s first commercial High NA EUV lithography systems , the TWINSCAN EXE:5000, at its H…

Intel becomes the first company to ship high-volume logic chips made with ASML’s High NA EUV — select Panther Lake layers on 18A are now dual-qualified for 0.55

by

Intel and ASML have been working towards this milestone for several years. In 2024, Intel completed installation of one of the industry’s first commercial High NA EUV lithography systems , the TWINSCAN EXE:5000, at its H…

Intel becomes the first company to ship high-volume logic chips made with ASML’s High NA EUV — select Panther Lake layers on 18A are now dual-qualified for 0.55

by

Intel and ASML have been working towards this milestone for several years. In 2024, Intel completed installation of one of the industry’s first commercial High NA EUV lithography systems , the TWINSCAN EXE:5000, at its H…