Intel surpasses one million High-NA EUV wafers processed, outpaces the rest of the industry combined — company also trailblazing giant 6×12 photomasks to speed
Moving from 6×6-inch to 6×12-inch photomasks would require substantial changes across the existing mask ecosystem, including mask blanks and deposition, etching, inspection and metrology, cleaning, pellicles, mask writer…
